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I.C. Abraham, J.R. Woodworth, M.E. Riley, P.A. Miller, Sandia National LaboratoriesgIon Energy Distributions at the RF-Biased Electrode in an Inductively-Driven Dischargeh
Proceedings of the 47th International Symposium of the American Vacuum Society October 2000

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gEtch product identification during CH4-H2 RIE of InP using mass spectrometryh
[ 14 ] Ch. Hollenstein, A.A. Howling, C. Courteille, D. Magni, S.M. Scholz, G.M.W. Kroesen, N. Simons, W. deZeeuw, and W.Schwarzenbach, J. Phys D: Appl. Phys. 30, 1 (1997)
gSilicon oxide particle formation in RF plasmas investigated by infrared absorption spectroscopy and mass spectroscopyh
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"Negative ions in a pulsed-power inductively-coupled chlorine plasma for etching"
[ 16 ] M.G. Blain and R.L. Jarecki and R.J. Simson Sandia National Laboratories, Albuquerque, New Mexico
J. Vac. Sci. Technol A 16 (4), Jul/Aug 1998 gChemical downstream etching of tungstenh
[ 17 ] M.G. Blain J.Vac.Sci.Technol. A 17 (2), 665-667, Mar/Apr 1999
gMechanism of nitrogen removal from silicon nitride by nitric oxideh Katsuyuki Okada, Shojiro Komatsu and Seiichrio Matsumoto
gIon Energy Distributions in a Low Pressure Inductively Coupled Plasma used for Nano crystalline Diamond Depositionh
Proceedings of ISPC-15 (Orleance, France, 2001)
[ 18 ] M. Fahland, C. Charton, V. Kirchhoff, U. Stohr,Deposition of multilayer optical coatings onto plastic webs by pulse magnetron sputtering;challenges and opportunitiesgProceedings 6th. International Symposium on Sputtering and Plasma Processes (ISSP),
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